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Although plasma technologies are already being used extensively and there is great interest in introducing new ones, there are obstacles to innovation. These often lie in the fact that methods function within an empirically found parameter window, but the processes are not sufficiently understood to still function reliably when extrapolated to higher rates and speeds.

Targeted process analysis requires modern, complex measurement methods and special expertise. Expertise and knowledge of research and development at the forefront is also necessary to assess and further develop the potential of new plasma processes for specific applications.