Double Ring Magnetron Facility (Cluster 250)
Cluster 250 - Double Ring Magnetron facility for magnetron sputter deposition.
Cluster 250 - Double Ring Magnetron facility for magnetron sputter deposition.
The Double Ring Magnetron contains two sputtering targets, thereby enabling homogeneous film on large size wafers.
The first rough assessment of the film property right after a deposition.
X-ray diffraction analysis is a technique used in materials science to determine the crystallographic structure of a material.